Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_03d0f52bb4069f8a19d70dcfb697c67a |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-106 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0048 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
filingDate |
1998-12-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_abf92c6162f276a54a5782dd87f205c1 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_82d2e7bd7d775c3e6365dd10d40840a1 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1e8c6788d846774f20e5ac920e2e11e3 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_601ba4a71019c4ad5d4dff3748ba6624 |
publicationDate |
2000-07-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
JP-2000187329-A |
titleOfInvention |
Positive photosensitive composition |
abstract |
PROBLEM TO BE SOLVED: To provide a resist pattern with good sensitivity and resolution, excellent adhesion and few development defects when using an exposure light source having a wavelength of 250 nm or less, especially 220 nm or less, and a sufficient dry etching resistance. To provide a positive photosensitive composition having the following formula: (A) A resin containing a repeating unit having a specific ring structure and having a group that increases the solubility in an alkali developer by the action of an acid, and (B) an acid is generated by irradiation with actinic rays or radiation. A positive photosensitive composition comprising a photoacid generator, and (C) a fluorine-based and / or silicon-based surfactant. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-4576737-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2002365803-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2002062657-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-0244845-A3 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2004514952-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-4574067-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-100793045-B1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-11620853-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2002311590-A |
priorityDate |
1998-12-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |