http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2000176310-A

Outgoing Links

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assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_069a92549123806a5d654dc036a676e9
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B03C3-38
filingDate 1998-12-18-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_009699789d3c9583d4c3442ab466da79
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ff823049302aa546ef700b0cfc88e0c5
publicationDate 2000-06-27-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2000176310-A
titleOfInvention Gas cleaning method and equipment
abstract PROBLEM TO BE SOLVED: To provide a gas cleaning method and apparatus capable of removing particulate matter with a simple structure. SOLUTION: A photoelectron 12 emitted by irradiating a photoelectron emitting material 4 with ultraviolet rays 5 and / or radiation under an electric field charges and traps fine particles 11 contained in the gas. In the cleaning method, the electrode for setting the electric field has an uneven surface or a porous surface, and forms an electric field of 0.5 to 10 KV / cm. In a gas cleaning apparatus having an electrode 6 for irradiation and an irradiation source 5 for irradiating the photoelectron emitting material with ultraviolet light and / or radiation, the electrode for electric field has an uneven surface or a porous surface, An electric field of 10 KV / cm is to be formed.
priorityDate 1998-12-18-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

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Total number of triples: 18.