http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2000176310-A
Outgoing Links
Predicate | Object |
---|---|
assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_069a92549123806a5d654dc036a676e9 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B03C3-38 |
filingDate | 1998-12-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_009699789d3c9583d4c3442ab466da79 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ff823049302aa546ef700b0cfc88e0c5 |
publicationDate | 2000-06-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-2000176310-A |
titleOfInvention | Gas cleaning method and equipment |
abstract | PROBLEM TO BE SOLVED: To provide a gas cleaning method and apparatus capable of removing particulate matter with a simple structure. SOLUTION: A photoelectron 12 emitted by irradiating a photoelectron emitting material 4 with ultraviolet rays 5 and / or radiation under an electric field charges and traps fine particles 11 contained in the gas. In the cleaning method, the electrode for setting the electric field has an uneven surface or a porous surface, and forms an electric field of 0.5 to 10 KV / cm. In a gas cleaning apparatus having an electrode 6 for irradiation and an irradiation source 5 for irradiating the photoelectron emitting material with ultraviolet light and / or radiation, the electrode for electric field has an uneven surface or a porous surface, An electric field of 10 KV / cm is to be formed. |
priorityDate | 1998-12-18-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 18.