| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2026
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-32 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D11-0047
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-168
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C11D7-5022 |
| classificationIPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-32 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-42
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D11-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-16
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D7-50 |
| filingDate |
1998-12-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7061c4c60aded3bce4671cc01549de7e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7ff9f5f34b315fa455ae8f12523b011d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5ab6894079cc2e725dba2cb817a338b3 |
| publicationDate |
2000-06-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2000171987-A |
| titleOfInvention |
Method for producing base material for electronic component and resist remover used therefor |
| abstract |
PROBLEM TO BE SOLVED: To use a resist remover which has high safety and meets the required performance for removing unnecessary resist film adhered to a peripheral portion, an edge portion and a back surface portion of a substrate. In addition, the present invention provides a manufacturing method for obtaining a base material for electronic components having excellent performance. SOLUTION: A coating solution for forming a radiation-sensitive resist film is applied to a substrate surface, dried, and then dried at least in a peripheral portion of the substrate. When manufacturing an electronic component substrate by dissolving and removing an unnecessary resist film adhering to the edge portion and the back surface portion using a resist removing agent, the resist removing agent is used as the resist removing agent. An organic solvent having a surface tension at a temperature of more than 35 dyne / cm and less than 60 dyne / cm and having solubility in a radiation-sensitive resist film is used. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7884062-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2018181963-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-4643467-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2007063985-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2007097233-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2007227645-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2007256710-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/KR-101011854-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2007324393-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2007179043-A |
| priorityDate |
1998-12-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |