http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2000147776-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_03d0f52bb4069f8a19d70dcfb697c67a |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate | 1998-11-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_601ba4a71019c4ad5d4dff3748ba6624 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1e8c6788d846774f20e5ac920e2e11e3 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_abf92c6162f276a54a5782dd87f205c1 |
| publicationDate | 2000-05-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2000147776-A |
| titleOfInvention | Positive photoresist composition for deep ultraviolet exposure |
| abstract | PROBLEM TO BE SOLVED: To provide a positive-type photoresist composition for deep ultraviolet exposure, which has a good dependency on the density of a resist pattern to be formed and is excellent in sensitivity to a short wavelength light source. (B) a compound capable of generating an acid upon irradiation with actinic rays or radiation; and (b) an acid containing an alkali-soluble group and a sulfonamide group protected by a group containing a specific alicyclic hydrocarbon structure. A positive photoresist composition for deep ultraviolet exposure, comprising a resin which is decomposed by the action of and increases the solubility in alkali. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2002173466-A |
| priorityDate | 1998-11-17-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 275.