| abstract |
(57) [Summary] [PROBLEMS] To solve the problems of the inherent performance improvement technology of microfabrication using electron beams or X-rays, and to provide sensitivity, resolution, and resist shape characteristics for electron beam use. Development of a negative chemically amplified resist composition for electron beams or X-rays satisfying the following conditions. SOLUTION: In a chemically amplified negative resist composition containing an alkali-soluble resin, a radiation-sensitive acid generator and a crosslinking agent crosslinked by an acid, a radiation-sensitive acid generator having the following conditions and a specific structure has a specific structure. The electron beam and X satisfying at least one condition of the low molecular weight phenol derivatives having a molecular weight of 1000 or less A chemically amplified negative resist composition for lines. |