http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2000144470-A

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assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_6bfdf49224a405be1f7b653c56ebad94
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C25B11-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C25D3-56
filingDate 1998-11-04-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e4d4b52d553055666f97fda1d235f145
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1ca1b88b53f44f5f4d6e02a391def5a1
publicationDate 2000-05-26-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2000144470-A
titleOfInvention Cleaning method for low hydrogen overvoltage electrode
abstract (57) [Summary] An object of the present invention is to provide a method capable of removing an organic substance remaining in an active cathode used for electrolysis of water or an aqueous solution of an alkali metal chloride such as salt at a high removal rate. Is to provide. A plating bath containing nickel ions, nickel ions and iron ions, or nickel ions and cobalt ions, or nickel ions and indium ions, contains amino acids, monocarboxylic acids, dicarboxylic acids, monoamines, diamines, triamines and tetramines. In a method for cleaning a low-hydrogen overvoltage electrode manufactured by plating an electrodeposit on a conductive substrate surface using a plating bath to which at least one or more organic substances are added, an organic substance remaining in the electrodeposit is removed by 40%. At a temperature of not less than 90 ° C. and not more than 90 ° C. and a hydroxide ion concentration of 0.0001 mol / l to 1 A method for cleaning a low-hydrogen overvoltage electrode, which is immersed in a 2 mol / l alkaline solution for cleaning and removal, and -1 to -100 m A method for cleaning a low hydrogen overvoltage electrode in which cleaning and removal are performed while applying a cathode current of A / cm 2 .
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2010061766-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-8349165-B2
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http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2015178668-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-6300253-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2012180537-A
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priorityDate 1998-11-04-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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