http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2000143670-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c5520dd38cc403678d9f91e0b0ee95fb |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-18 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07F7-0803 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07F1-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07F1-08 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07F7-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07F1-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07F1-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-18 |
| filingDate | 1999-10-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ac4311651b12a9e13a563e55918d1c1b http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_df5360aa370bc9dce1aa973d9c1e5d76 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1c6909112efa2c018c42c43f5d29940e http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6b45139fffa179515c23ac6002e91898 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1923a529d176ee96ee58d954c1c0e9d6 |
| publicationDate | 2000-05-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2000143670-A |
| titleOfInvention | Allyl ligand precursor and method of synthesis |
| abstract | PROBLEM TO BE SOLVED: To provide a copper precursor which has low resistivity and good adhesive properties and can deposit copper effectively. A metal is deposited on a selected surface by chemical vapor deposition (CV). A volatile metal (M) precursor compound for deposition according to D), wherein the precursor compound comprises M +1 (hexafluoroacetylacetonate), a first bond to methylene and a second bond to hydrogen And a second carbon atom double bonded to the first carbon atom, wherein the second carbon atom has a third bond to hydrogen and a fourth bond to hydrogen. An allyl-derived ligand, wherein the methylene is an alkyl, phenyl, trialkylsilane, Selected from the group including trialkoxyl silane, halodialkyl silane, dihaloalkyl silane, trihalo silane, triphenyl silane, alkoxyl, halogen, chloroformate, cyanide, cycloalkyl, cycloalkylamine, alkyl ether, isocyanate, pentafluorobenzene An allyl-derived ligand having a fifth bond, thereby forming a stable precursor that allows for a high metal deposition rate. |
| priorityDate | 1998-11-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 86.