| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L61-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L61-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G8-28
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G8-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0236 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-023
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L61-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L61-12
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G8-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G8-28 |
| filingDate |
1998-11-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8fffc9ab1d382ccfd1a59ccc5eb62349
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_93c73d832f83b05a2bba1832f671c118
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_918b29368c80a2d3b7671d4534129f20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7f08ea87295ed56b59dae70df070c234
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9d893ea20efbe42083f3fd2ecee5638a |
| publicationDate |
2000-05-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2000137324-A |
| titleOfInvention |
Positive photoresist composition and multilayer resist material using the same |
| abstract |
(57) [Summary] [PROBLEMS] To reduce the occurrence of scum even in the process of forming an ultrafine pattern of 0.30 μm or less, An object of the present invention is to provide a positive photoresist composition which is excellent in various properties such as a profile shape and a depth of focus and has an ultra-high resolution. SOLUTION: In a positive photoresist composition containing (A) an alkali-soluble novolak resin and (B) an esterified product of naphthoquinonediazide, the alkali-soluble novolak resin is subjected to a condensation reaction between a phenol compound and an aldehyde or ketone. The phenol compound is, for example, 1 to 20 mol% of hydroquinone, 30 to 95 mol% of m-cresol and 2.5 -A positive photoresist composition wherein xylenol is used in a range of 2 to 50 mol%. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7314810-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-03041070-A1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2009074004-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7297472-B2 |
| priorityDate |
1998-11-02-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |