| abstract |
PROBLEM TO BE SOLVED: To provide a chemically amplified photosensitive polymer and a resist composition having a remarkable difference in solubility in a developing solution before and after exposure and having excellent resist contrast. SOLUTION: Formula: embedded image Wherein R 1 , R 3 and R 5 are each selected from the group consisting of —H and —CH 3 , and R 2 is selected from the group consisting of t-butyl, tetrahydropyranyl and 1-alkoxyethyl groups; R 4 is selected from the group consisting of —H, —CH 3 , t-butyl, tetrahydropyranyl and 1-alkoxyethyl groups, x is an integer of 1 to 4, and 1 / (l + m + n) is 0.1 M / (l + m + n) is 0.01 to 0.5 Where (l + m) / (l + m + n) is 0.1 to 0.7. A) a polymer used as a chemically amplified resist, And a chemically amplified resist composition containing the same. |