| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-106 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0382 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 |
| filingDate |
1998-10-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a80a742a166bc52b7b2320a7dc979cb9
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_853861c0b322e06c4a82d380374b3c87
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_757f8711d3b59c4a88a269e18468cfe7
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_73f447e427e142b0614cd9ae99816738 |
| publicationDate |
2000-05-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2000131843-A |
| titleOfInvention |
Negative resist composition |
| abstract |
(57) [Summary] [Object] To provide a practical negative resist composition which is excellent in resolution and profile shape and has good stability over time. A negative resist composition comprising (A) a diazosulfonic acid compound which generates an acid upon irradiation with radiation and (B) an organic amine compound. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2018060205-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-7879525-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2008268935-A |
| priorityDate |
1998-10-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |