| abstract |
PROBLEM TO BE SOLVED: To provide a chemically amplified resist material having sufficient sensitivity to light or radiation, a photosensitive resin composition using the material, and a method for manufacturing a semiconductor device using the photosensitive resin composition. Develop a method to use. SOLUTION: For example, a random copolymer of 4-hydroxystyrene / methyl-4-sulfide-tert-butoxycarbonyloxystyrene = 0.7 / 0.3 (molar ratio) is used as a material for an alkali-insoluble chemically amplified resist, A photosensitive resin composition is manufactured and used for manufacturing a semiconductor device. |