http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2000119486-A
Outgoing Links
Predicate | Object |
---|---|
assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_5128cfc84a0fb189fceb3cd240c44493 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K5-17 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L59-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K5-3475 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K5-3435 |
filingDate | 1998-10-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7b3d74585b3e45623e8c529903e7b3dd http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_763124336eb09bbe87e12878ef07b965 |
publicationDate | 2000-04-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-2000119486-A |
titleOfInvention | Polyacetal resin composition |
abstract | (57) [Problem] To provide a polyacetal resin composition in which the polyacetal resin has improved weather resistance, heat aging resistance, short-term thermal stability, mold deposit resistance and color unevenness at the same time. (A) Polyacetal resin and (B) 1) A polyacetal resin composition obtained by adding and blending at least two types of a benzotriazole-based ultraviolet absorber represented by the following general formula and a hindered amine-based light stabilizer (C). Embedded image (Wherein, R1, R2, and R3 are alkyl groups having 1 to 10 carbon atoms) |
priorityDate | 1998-10-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 321.