http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2000114148-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_80787665b837ed3eb503bbcd27c0043a |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F9-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate | 1998-10-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_09220d7f052ea07478eb2bcfcf6fcdb8 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_18a1da4636402283d001a7cdac04ca40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d8b9af293fec76e32f15664e35ce4750 |
| publicationDate | 2000-04-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2000114148-A |
| titleOfInvention | Method for manufacturing semiconductor device |
| abstract | (57) [Problem] To achieve high-accuracy mask-wafer alignment in X-ray lithography. SOLUTION: A wafer 8 is irradiated with a soft X-ray 3 passing through an X-ray mask 4 via an imaging optical system including reflecting mirrors 6 and 7 to form a soft X-ray 3 on a transfer pattern area 4a of the X-ray mask 4. X for transferring circuit pattern to wafer 8 In the line exposure apparatus, a wafer mark 9 provided on a wafer 8 is made of a substance that emits light 1 such as fluorescence when irradiated with soft X-rays 3 and is reflected from an alignment mark pattern 5 of an X-ray mask 4. The soft X-rays 3 are reduced and imaged, and irradiate a wafer mark 9 on the wafer 8, and light emission 1 such as fluorescence generated at this time is detected by the photodetector 2, thereby forming the X-ray mask 4 and the wafer 8. Is performed with high accuracy. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2020509409-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2005500679-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-7050078-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2002141280-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2002333721-A |
| priorityDate | 1998-10-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 34.