| abstract |
(57) [Abstract] (with correction) [Problem] A chemically amplified positive that is excellent in substrate adhesion, dry etching resistance, resolution, heat resistance, etc. and can obtain an excellent resist pattern regardless of the type of substrate. Provision of a photoresist composition. SOLUTION: The repeating unit is the general formula (I), and the weight average molecular weight (Mw) in terms of polystyrene is 3,000 to 5, 000, molecular weight distribution (Mw / Mn) is 1.0 to 2. A composition comprising a polymer represented by formula (1), a low molecular compound represented by formula (VI), an acid generator and a solvent. R 1 and R 2 represent a methyl group, an ethyl group, a t-butyl group, an alkoxyalkyl group or the like. l, m, n and o each represent a repeating unit in the main chain, and l + m + n + o is 1; The content ratio of o has a value of 0.4 to 0.6. R 3 and R 4 represent a hydrogen atom and a hydroxyl group, and R 5 represents a lower alkyl group, an alkyl group containing bicyclo [2,2,1] heptane, adamantane, and bicyclo [4,4,0] decane. |