http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2000096048-A

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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K11-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K11-79
filingDate 1998-09-18-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1d0d44ed8fbc641e597ff8f52d27022d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ecd6de1b96415d481b2675dde1a50ceb
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publicationDate 2000-04-04-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2000096048-A
titleOfInvention Method for producing terbium-activated yttrium silicate phosphor
abstract (57) [Abstract] [Purpose] Excellent emission characteristics with narrow particle size distribution, few aggregated particles, high purity, uniform chemical composition, and capable of forming a dense high-brightness fluorescent film. The present invention provides a method for producing the terbium-activated rare earth silicate phosphor shown. [Constitution] An aqueous solution containing terbium, silicon, and yttrium is prepared, and a droplet composed of the aqueous solution is introduced into a pyrolysis reaction furnace by a carrier gas at 1050 to 1700 ° C. A step of heating at a temperature within the range of 1 second to 10 minutes, or introducing the droplets into a pyrolysis reaction furnace by a carrier gas, and After heating at a temperature in the range of 0 ° C. for a residence time in the range of 1 second to 10 minutes, this is further heated to 1050 A method for producing a terbium-activated yttrium silicate phosphor, comprising a step of reheating at a temperature in the range of 1 to 1350 ° C for a time in the range of 1 second to 24 hours.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-0140402-A1
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priorityDate 1998-09-18-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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