http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2000075472-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_47cc435e1d443f13180f7766df104d9d http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_80787665b837ed3eb503bbcd27c0043a |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-30 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 |
| filingDate | 1998-08-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7cdae1f0b9abbcc7b3c1399b12b4d991 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c9b865a1c7b6c4fa014e8f8ab46e0bb8 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1298dffa147859b80f09941451ece3f8 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3844f5ca7d38836d39a28971fd0e93c3 |
| publicationDate | 2000-03-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | JP-2000075472-A |
| titleOfInvention | Positive photosensitive resin composition and method for producing resist image |
| abstract | PROBLEM TO BE SOLVED: To provide a pattern by changing the solubility of an irradiated part and an unirradiated part in an alkali developing solution by destruction of polyolefin sulfone in a pattern latent image forming part due to irradiation of a pattern of radiation. Provided is a positive photosensitive resin composition having high sensitivity, high resolution and good stability, and a method for producing a resist image capable of stably forming a positive resist pattern with good resolution using the same. . SOLUTION: (a) an alkali aqueous solution-soluble resin, (B) General formula (I) (Wherein, R 1 and R 2 represent hydrogen, an alkyl group having 1 to 4 carbon atoms, an aryl group or an aryl group having a phenolic hydroxyl group, and R 3 and R 4 represent an alkyl group having 1 to 3 carbon atoms. , F and g are 0, 1 or 2, h and i are 1, 2 or 3. Or a polyphenol compound represented by the general formula (II): (Wherein, R 5 and R 6 represent an alkyl group having 1 to 3 carbon atoms, j and k are 0, 1 or 2, and l and m are 1, 2 Or 3. A) a positive photosensitive resin composition containing the polyphenol compound represented by the formula (1) and (c) polyolefin sulfone; and a method for producing a resist image using the same. |
| priorityDate | 1998-08-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 76.