http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2000063460-A
Outgoing Links
Predicate | Object |
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assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_669c01133740c5233f2c8738904ea3af |
classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03H1-028 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F290-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F299-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03H1-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03H1-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L33-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-033 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G02B5-18 |
filingDate | 1998-08-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_620e1bd04155e90df29a6b59755907ff http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7c2a3d149296438faf0dfc335f9cc73e |
publicationDate | 2000-02-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | JP-2000063460-A |
titleOfInvention | Photocurable resin composition and method for forming uneven pattern |
abstract | (57) [Abstract] (With correction) [Problem] A film having excellent strength, heat resistance, scratch resistance, water resistance, chemical resistance, and adhesion to a substrate can be formed, and the adherend is bent. Provided is a photo-curable resin composition capable of forming a diffraction grating, a relief hologram, and the like having a property of being compatible with expansion and contraction. A photocurable resin composition comprising a urethane-modified acrylic resin represented by the following structural formula and a release agent as essential components, and formation of a concave-convex pattern using the composition Method. (In the formula, Z represents a group imparting releasability, and six R 1 Each independently represent a hydrogen atom or a methyl group, R 2 represents a C 1 to C 16 hydrocarbon group, and X and Y each represent a linear or branched alkylene group. ) |
isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2006146162-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2006008554-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-4498838-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-WO2004113971-A1 |
priorityDate | 1998-08-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 96.