| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d93502a23a72b56472bc75854cfe7c60 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-023
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-022
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate |
1998-07-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_265689a4b33cdd9ca246e95c36a11278
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b159307681fe01f7ee6b3c5293474175 |
| publicationDate |
2000-01-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2000029208-A |
| titleOfInvention |
Positive resist composition |
| abstract |
(57) [Problem] To provide a positive resist composition in which sensitivity, resolution, pattern shape, and heat resistance are highly balanced. SOLUTION: An alkali-soluble phenol resin (A), A positive resist composition comprising a quinonediazidosulfonic acid ester of a polyhydroxy compound having a 4-aromatic ring skeleton (B) and a quinonediazidesulfonic acid ester of a polyhydroxy compound having a 2-aromatic ring skeleton (C). |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-100351700-C
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2007304592-A |
| priorityDate |
1998-07-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |