| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_1d29f7ac2c7f9be9f7dae1a83bbb5c92 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D7-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D7-60
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D7-18
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D7-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304 |
| filingDate |
1998-07-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_44eddf5d499ea0aecd3221c0354bd9df
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_1992379429521c345f7f38e0f3552f98 |
| publicationDate |
2000-01-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
JP-2000026895-A |
| titleOfInvention |
Cleaning agent for chemical mechanical polishing equipment |
| abstract |
(57) Abstract: A method of cleaning a chemical mechanical polishing apparatus for stably operating the chemical mechanical polishing apparatus without lowering the product yield. An aqueous solution of a base such as tetramethylammonium hydroxide containing peroxide or ozone is passed through a flow path of an abrasive in a chemical mechanical polishing apparatus. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2016113485-A |
| priorityDate |
1998-07-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |