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inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_dcea9769f2a45f073fcc91f46ce42773
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publicationDate 2000-01-25-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber JP-2000026840-A
titleOfInvention Abrasive
abstract (57) [Problem] To provide a polishing material which is excellent in mass productivity by improving the polishing rate of a polishing material in which conventional silica is added as abrasive grains. The number average particle diameter of primary particles is from 0.01 to 0.1. 5 μm and a diffraction angle of 28.6 ° (1 11) A cerium oxide powder comprising a cerium oxide powder having a half-value width 2θ (゜) of 0.7 to 0.15 °.
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http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6585787-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/JP-2015120844-A
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