| abstract |
(57) [Problem] To provide a chemically amplified positive photoresist composition excellent in exposure latitude and resolution. SOLUTION: The following formula (I) (Wherein R 1 and R 2 independently represent alkyl or cycloalkyl, but the total carbon number of both is 4 to 10), and is insoluble or hardly soluble in alkali. The resin (A), the acid generator (B), which becomes alkali-soluble by the action of an acid from the soluble state, and the following formula (II) (In the formula, R represents a hydrocarbon residue) A positive photoresist composition containing a photobase generator (C) which decomposes under the action of light to produce an amine. |