http://rdf.ncbi.nlm.nih.gov/pubchem/patent/IE-20180608-U1
Outgoing Links
Predicate | Object |
---|---|
assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_1a7464200aadc9f934f6c445bc110578 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C303-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C309-00 |
filingDate | 2018-12-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_565c3e06fdb0349fac5ac2353de2c7ad |
publicationDate | 2020-09-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | IE-20180608-U1 |
titleOfInvention | Heat-resistant resin antistatic agent sodium secondary alkyl sulfonate production plant |
abstract | Heat-resistant resin antistatic agent sodium secondary alkyl sulfonate production plant, including: tank (F101), photochemical reactor (D101), chiller (C101), flash chamber (L 102), separation tank (L101, L103—L105), reflux pump (J101), falling film evaporation tower (E101), bleach tank (D102), neutralization tank (D103), transfer pump (J102 — J107), evaporator (E102), stripper (E103); among them, tank (F101) is used to store hydrogen peroxide; among them, transfer pump (J107) is connected respectively to tank (F101) and bleach tank (D102), transfer pump (J102) is connected respectively to separation tank (L101) and flash chamber (L102); among them, cylinder wall thickness of tank (F101) is 7-8 mm. |
priorityDate | 2018-12-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 15.