http://rdf.ncbi.nlm.nih.gov/pubchem/patent/IE-20180608-U1

Outgoing Links

Predicate Object
assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_1a7464200aadc9f934f6c445bc110578
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C303-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C309-00
filingDate 2018-12-13-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_565c3e06fdb0349fac5ac2353de2c7ad
publicationDate 2020-09-30-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber IE-20180608-U1
titleOfInvention Heat-resistant resin antistatic agent sodium secondary alkyl sulfonate production plant
abstract Heat-resistant resin antistatic agent sodium secondary alkyl sulfonate production plant, including: tank (F101), photochemical reactor (D101), chiller (C101), flash chamber (L 102), separation tank (L101, L103—L105), reflux pump (J101), falling film evaporation tower (E101), bleach tank (D102), neutralization tank (D103), transfer pump (J102 — J107), evaporator (E102), stripper (E103); among them, tank (F101) is used to store hydrogen peroxide; among them, transfer pump (J107) is connected respectively to tank (F101) and bleach tank (D102), transfer pump (J102) is connected respectively to separation tank (L101) and flash chamber (L102); among them, cylinder wall thickness of tank (F101) is 7-8 mm.
priorityDate 2018-12-13-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

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http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID784
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID457765275

Total number of triples: 15.