abstract |
The present invention relates to an absorbent composition for cleaning acidic component-containing gases. The compound of the present invention is a compound of formula (I) wherein n is 2 or 3, R1 is methyl, or one of them is hydrogen, and further methyl, and R2 is hydrogen, methyl or - (CH2) 2-3 (CH3). ) Contains 2 groups - contains 20-60% by weight aqueous solution. ŕ |