http://rdf.ncbi.nlm.nih.gov/pubchem/patent/GB-2599392-A
Outgoing Links
Predicate | Object |
---|---|
assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fc4336d376f51e8db6290bb64a1699dd |
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-34 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3211 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-321 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3417 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32357 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3464 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-35 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-3277 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32669 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-35 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-32 |
filingDate | 2020-09-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6739020d7e97121e9eaeaaf7c9290d78 |
publicationDate | 2022-04-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | GB-2599392-A |
titleOfInvention | Sputter deposition apparatus and method |
abstract | A sputter deposition apparatus (100, figure 1) comprises a process chamber (102), a substrate assembly (106) and a sputter target assembly (110) defining a deposition zone (112) therebetween, a helicon plasma source array 116 comprising a plurality of helicon plasma sources 117 each comprising a radio frequency (RF) antenna 118 for generating helicon waves that propagate away from the antenna in a launch direction 142 to generate a plasma 138. The array is preferable elongate to generate a sheet of plasma extending laterally into the deposition zone. Each plasma source may generate a plume of plasma 144 that overlaps with an adjacent plume. First and second pluralities of plasma sources (517a, 517b, figure 10) may be provided at opposite sides of the deposition zone. One or more permanent magnets (428, figure 9b) may be provided to establish a magnetic field having a direction parallel to the launch directions. The substrate assembly may comprise one or more rollers (246, 248, 250, figure 4) for transporting a flexible substrate (204) through the deposition zone. |
priorityDate | 2020-09-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 23.