http://rdf.ncbi.nlm.nih.gov/pubchem/patent/GB-2588940-A

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filingDate 2019-11-15-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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publicationDate 2021-05-19-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber GB-2588940-A
titleOfInvention Sputter deposition
abstract Sputter deposition apparatus which comprises a plasma generation arrangement, a target 304 and a cartridge 300 which is removable from the rest of the apparatus and comprises two reels 308 & 310 and a web of substrate which can be conveyed from reel to reel while a film is deposited on the web. Figures 1 and 3 show a cartridge which further comprises sputter targets and respectively a closable aperture and a transparent region 128 through which a plasma 320 can be introduced. The cartridges 300 can be used as vacuum chambers to store substrate which has had a film deposited thereon. Figure 2 shows a similar cartridge which has a further chamber 206 in which the second reel 210 is located. Figure 5 shows apparatus where targets 540 are provided inside the cartridge but are moved outside the cartridge and located on supports 518 during deposition. The web is moved out of and back into the cartridge with deposition occuring outside the cartridge as it is fed from reel to reel.
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Total number of triples: 27.