| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_0dd3a26be0af8dfeed6ad7050b521cf1 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D2259-818
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D2259-652
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D2258-0216
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D2259-65
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D2257-206 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D53-343
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67017
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D53-005
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D53-75
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-67098
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D53-78
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D53-79
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D53-323 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01D53-78
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01D53-75
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01D53-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01D53-34
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01D53-79 |
| filingDate |
2018-02-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a51c9ae9229724f1a1a72f56e8dc71ab
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_49bd5a5aca81740e75f83ce9d7384451 |
| publicationDate |
2019-05-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
GB-2568772-A |
| titleOfInvention |
Gas treating apparatus |
| abstract |
A gas treatment apparatus comprises a duct component (100) formed by a flow channel (101) wherein gas to be treated flows. An interior cover component (200) is installed on the exterior of the circumferential surface of the duct component and a solution supply apparatus (400, Fig 1) is connected to a vaporisation chamber (S1) formed between the duct component and the interior cover component to inject reaction solution into the vaporisation chamber. The duct component is provided so that the heat of gas to be treated is conveyed to the reaction solution injected into the vaporisation chamber. The gas treatment apparatus may comprise a reaction unit (10), DeNOx unit (20), quenching unit (30), heating apparatus (40), control unit (50), wastewater treatment unit (60) and post‐processing unit (70). The gas treatment apparatus may find use in semiconductor manufacturing processes and could provide a gas treating apparatus able to increase the efficiency of processing halogen compounds in a gaseous state and reduce the amount of by‐products such as nitrogen oxides. |
| priorityDate |
2017-11-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |