| abstract |
Polysiloxane films and method of preparation thereof using plasma deposition A polysiloxane film comprising Si-0 bonds and having a thickness of 0.3 to 1.5 microns. The polysiloxane film is formed by plasma polymerisation of a siloxane monomer, such as hexamethylcyclotrisiloxane (HMCTS), phenethyltrimethoxysiloxane (PETMS) using a radio frequency (RF) generator. Also disclosed is use of the plasma deposited polysiloxane films in coating electronic devices, such as printed circuit boards (PCBs). The polysiloxane films can provide protection from ingress of water. |