http://rdf.ncbi.nlm.nih.gov/pubchem/patent/GB-2527671-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_8fb9f44db08d1c42a53f3d28eaae416f |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G11B5-8404 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09G1-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-1463 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09G1-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G11B5-84 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K3-14 |
| filingDate | 2015-05-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f8fd7e0c38497becdd7eaee15418cd55 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a3ecfcac8ccb27321aee1ebb7c8fc012 |
| publicationDate | 2015-12-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | GB-2527671-A |
| titleOfInvention | Polishing liquid composition for a magnetic disk substrate |
| abstract | A polishing liquid composition for a magnetic disk substrate, comprisingnon-spherical silica particles at least two of which are agglomerated or fused together, an organic amine with two or three nitrogen atoms in its molecules, and water. The silica particles may be spinous-shaped, heteromorphic (fig. 1) or combinations thereof, their volume average particle size D50 ranging from 50 to 500 nm. The organic amine content of the composition is preferably 0.0025-0.20% wt, its molecular weight ranging from 60 to 500. Suitable amines are aminoethylethanolamine, ethylenediamine, diethylenetriamine, piperazine, N-(2-hydroxyethyl)piperazine etc. The pH of the liquid polish may be 0.5-6.0. A method for producing a magnetic disk substrate, such as a Ni-P-plated aluminium alloy substrate, is also claimed, comprising the steps of rough polishing the substrate surface in a first polishing machine using the liquid polish defined above, cleaning it, then fine polishing it in a second polishing machine using another liquid polish with silica particles. A polishing pad of suede type may be employed during the rough polishing step, having a base layer and a foamed surface layer with a compressibility of at least 2.5%. The invention aims at reducing long cycle defects on the substrate after rough polishing. |
| priorityDate | 2014-05-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 118.