| abstract |
A method for doping a graphene and carbon nanotube thin-film transistor field-effect transistor device to decrease contact resistance with a metal electrode, comprising; selectively applying a dopant to a metal contact region of a graphene and nanotube field-effect transistor device. Also disclosed are graphene and nanotube thin-film, field effect transistors: where the dopant is disposed on the graphene/nanotube layer 140 and the metal electrodes formed thereafter; and where the graphene/nanotube layer is formed over the metal electrodes and the dopant is selectively applied to the areas above the dopant, respectively. The dopant may be one of cerium ammonium nitrate, cerium ammonium sulphate, ruthenium bipyridyl complex or triethyloxonium hexachloro antimonate. The dopant may be provided in a solution, where the solvent may be one of dichloroethane, alcohol or dichlorobenzene. The dopant may be applied to the transistor by immersing the transistor in the solution for a predetermined time. |