| abstract |
A rinsing composition contains at least one water-soluble polymer selected from a water-soluble polysaccharide, polyvinyl alcohol, polyethylene oxide, polypropylene oxide, a copolymer of ethylene oxide and propylene oxide, and a hydrophilic polymer obtained by adding an alkyl group or an alkylene group to the copolymer. The rinsing composition may be used in rinsing polished silicon wafers. Preferably the rinsing composition contains essentially no alkaline compounds. Preferably the polysaccharide is hydroxyethyl cellulose or pullulan. |