| abstract |
A photoresist stripper composition comprises of a mixture of acetone, <I>y</I>-butyrolactone, and ester solvent. The photoresist stripping method includes spraying a photoresist stripper composition comprising a mixture of acetone, <I>y</I>-butyrolactone and an ester solvent, over a substrate while rotating the substrate at a relatively low speed, so as to strip photoresist from the substrate. The rotation of the substrate is stopped for a short period of time, and the photoresist stripper composition is sprayed over the substrate while rotating the substrate at a relatively high speed. The substrate is then rinsed with pure water. |