Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_aa355ca64f7649683f814ec1c912062c |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02211 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02271 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-401 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02126 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3122 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-316 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-312 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-40 |
filingDate |
1999-01-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_223038830278089abc8b6541a51108c2 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4c9b3cecc5c9899f48bd46bff64eebf6 |
publicationDate |
2000-08-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
GB-2346898-A |
titleOfInvention |
Deposition of a siloxane containing polymer |
abstract |
There is disclosed a method of treating a substrate, which method comprises positioning the substrate in a chamber (2), introducing into the chamber in the gaseous or vapour state a silicon-containing compound, a further compound containing peroxide bonding, and a substance which associates readily the compound containing peroxide bonding, the method further comprising the step of reacting the silicon-containing compound with the further compound and the soluble substance to provide on the substrate an insulating layer. Also disclosed is an apparatus for implementing the method. |
priorityDate |
1998-01-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |