| abstract |
A polymer suitable for use as an anti-reflective coating of a semiconductor device is a polyhydroxystyrene, a poly(styrene-acrylate), or a novolac polymer, which polymers are substituted with the diazonaphthoquinonesulfonyl group shown below: <EMI ID=1.1 HE=42 WI=50 LX=786 LY=948 TI=CF> An anti-reflective coating composition is disclosed which comprises one of the aforementioned polymers and at least one light absorbing compound selected from anthracene, fluorenone, fluorenol, xanthone, quinazarin, fluorescein, and the derivatives of anthracene and fluorenone. Process for preparing the diazonaphthoquinonesulfonyl substituted polymers and the coating composition are also described. |