abstract |
A composition for removing resist, polymeric material and/or etching residue from a substrate comprising titanium or an alloy thereof, comprises hydroxylamine or a derivative thereof and one or more compounds selected from 2,3-dihydroxytetralin, 2,3-dihydroxynaphthalene and/or nordihydroguaiaretic acid. The composition also inhibits corrosion of titanium and its alloys. |