| abstract |
A resist composition exhibiting an improved profile performance without impairing resolution or sensitivity comprises a binder component; a radiation-sensitive component; and a succinimide compound represented by the following formula (I): <EMI ID=1.1 HE=30 WI=71 LX=501 LY=826 TI=CF> <PC>wherein Q<SP>1</SP> represents an alkyl group which may be optionally substituted with alkoxy, halogen or nitro, an alicyclic hydrocarbon residue, an aryl group, or an aralkyl group; and Q<SP>2</SP>, which may be the same as or different from Q<SP>1</SP>, represents hydrogen, an alkyl group which may be optionally substituted with alkoxy, halogen or nitro, an alicyclic hydrocarbon residue, an aryl group, or an aralkyl group. The additive may be included in a variety of formulations including quinone diazide positive resists, azide initiated negative resists, and resists of the chemical amplification type which release an acid on exposure. |