http://rdf.ncbi.nlm.nih.gov/pubchem/patent/GB-2319531-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_2d4ba6b2e50fefcae1a13b759f0f208c |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C02F1-42 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C02F2201-46115 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C02F9-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C02F2103-40 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B01D61-44 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C02F1-441 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C02F1-4693 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C02F1-461 |
| classificationIPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C02F1-42 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C02F9-00 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C02F1-44 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01D61-44 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C02F1-461 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C02F1-469 |
| filingDate | 1997-11-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_133abf3585e3598bc0fdd51daf9e3a18 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9f603d0e9130711d8a579800c19f3815 |
| publicationDate | 1998-05-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | GB-2319531-A |
| titleOfInvention | Rejuvenation of photoresist development waste to recover tetraalkylammonium hydroxide |
| abstract | A rejuvenation treatment of a photoresist development waste mainly containing a photoresist and tetraalkylammonium (TAA) ions comprises at least the step of concentration of TAA ions by electrodialysis and/or electrolysis, and the step of removal of impurities, such as residual photoresist, other anionic components, cationic components such as Na + , by adsorption thereof on an ion exchange resin preferably an anion exchange resin and/or a cation exchange resin in at least one of the hydrogen ion form and the TAA ion form through contact therebetween, whereby a high-purity solution of a tetraalkylammonium hydroxide reutilizable as a photoresist developer can be simply and efficiently regenerated and recovered from the photoresist development waste. A step of concentration by evaporation and/or reverse osmosis membrane treatment may desirably be taken at least before electrodialysis and/or electrolysis. The absorption step may be carried out before or after electrolysis and/or electrodialysis. |
| priorityDate | 1996-11-21-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 60.