http://rdf.ncbi.nlm.nih.gov/pubchem/patent/GB-2298960-A

Outgoing Links

Predicate Object
assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fdad00677b9268c26e005a9e03a7b9dd
classificationCPCAdditional http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2924-0002
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24B49-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-1463
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24B37-013
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24B49-16
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24B49-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31053
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24B37-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24B49-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L22-26
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-66
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B49-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B49-16
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B49-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B37-04
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-3105
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B49-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K3-14
filingDate 1993-05-26-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_31c67ada633b7d4707e1a81572039a6d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7458e40273196eb9c69bf4339b71cb97
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c814693b70e7e226090183752ab7a91e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cc73e31886ac1047e89298221ccec452
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f56fde2ddc2940dc8d74ce1710c0972b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_72f0bb4d65c1cc555c4de135a2546d5a
publicationDate 1996-09-18-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber GB-2298960-A
titleOfInvention Polishing apparatus and method
abstract Reproducible polishing of semiconductor wafers and devices is obtained by adapting the polishing conditions in accordance with the ratio between an initial detected friction value and a friction value detected after a predetermined period of time.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1052060-A2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-1052060-A3
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6319106-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6283828-B1
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6905957-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/GB-2350077-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/GB-2384910-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/GB-2350077-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6648728-B2
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/SG-106633-A1
priorityDate 1992-05-26-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

Predicate Subject
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5036015-A
isDiscussedBy http://rdf.ncbi.nlm.nih.gov/pubchem/anatomy/ANATOMYID3902
http://rdf.ncbi.nlm.nih.gov/pubchem/taxonomy/TAXID2786
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419580923
http://rdf.ncbi.nlm.nih.gov/pubchem/anatomy/ANATOMYID8953
http://rdf.ncbi.nlm.nih.gov/pubchem/taxonomy/TAXID3902
http://rdf.ncbi.nlm.nih.gov/pubchem/taxonomy/TAXID3908
http://rdf.ncbi.nlm.nih.gov/pubchem/taxonomy/TAXID191188
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419530817
http://rdf.ncbi.nlm.nih.gov/pubchem/anatomy/ANATOMYID191188
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID77731
http://rdf.ncbi.nlm.nih.gov/pubchem/taxonomy/TAXID8953
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID3001055
http://rdf.ncbi.nlm.nih.gov/pubchem/anatomy/ANATOMYID2786
http://rdf.ncbi.nlm.nih.gov/pubchem/anatomy/ANATOMYID3908

Total number of triples: 57.