http://rdf.ncbi.nlm.nih.gov/pubchem/patent/GB-2298312-A

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http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01S5-026
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filingDate 1996-02-22-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0a49fb53b3c71ed568f003b20b49d4fa
publicationDate 1996-08-28-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber GB-2298312-A
titleOfInvention A method of making a double-heterostructure optical semiconductor device by the movpe method
abstract A method of fabricating an optical semiconductor device, comprises the steps of: forming a plurality of growth-blocking masking regions 12 of silicon dioxide on a first conductivity type compound semiconductor substrate; ```forming a double-heterostructure 18 which comprises a first conductivity type cladding layer 14, a light absorption layer 15 and a second conductivity type cladding layer 17 on a mask-opening region by the metal organic vapour phase epitaxy method; ```partially removing said masking regions on both sides of said double-heterostructure and opposite sides thereof to provide opening regions; and ```forming a burying layer 20 on said-double heterostructure by the metal organic vapour phase epitaxy method. The method may be used to form a laser based on InGaAsP with InP cladding layers 14, 17.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0827243-A1
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priorityDate 1995-02-22-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 23.