| abstract |
A chromium plating method using a plating bath comprising trivalent chromium has an electrode which is an anode comprising an electrode substrate e.g. of titanium, tantalum, zirconium, niobium or an alloy thereof, coated with an electrode catalyst comprising at least iridium oxide and, optionally, at least one of titanium, tantalum, niobium, zirconium, tin, antimony, ruthenium, platinum, cobalt, molybdenum, tungsten or an oxide thereof. The anode may be disposed directly in the chromium plating bath or may be disposed in an anode chamber partitioned from the chromium plating bath by an ion-exchange membrane. The chromium plating method may be a barrel plating method. The formation of hexavalent chromium at the anode is suppressed and sludge formation prevented. |