http://rdf.ncbi.nlm.nih.gov/pubchem/patent/GB-1535998-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_c23a1323673a16fb6f1c1f6df4fe292b |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0757 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G77-04 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G77-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G77-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G77-06 |
| filingDate | 1976-03-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 1978-12-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | GB-1535998-A |
| titleOfInvention | Method of manufacturing an electron-sensitive negative resin and an application of said resin to integrated optics |
| abstract | 1535998 Electron sensitive polysiloxane resin THOMSON-CSF 8 March 1976 [11 March 1975] 9254/76 Heading C3T [Also in Division B2] An electron-sensitive polysiloxane resin is prepared by (1) hydrolysing phenyltrichlorosilane to phenyl-silane triol, (2) polycondensing the product from (1) in an azeotropic mixture of diphenyl and diphenyl oxide in the presence of potassium at a temperature of 250‹ to 300‹ C., then cooling and then precipitating the polyphenylsiloxanols by the addition of methanol, and (3) then fractionally separating the polyphenylsiloxanols of different molecular masses using successive filtration operations, thus obtaining batches of polymers each having a particular mean molecular mass fitting the manufacturing of a typical optical waveguide. Step (2) may additionally comprise an intermediate filtering operation of a solution of the polycondensate through a diaphragm having pore sizes of 0À2 microns. The third step may be carried out by first dissolving the polycondensate from step (2) in benzene to form a 1% wt. solution, then filtering the solution through a filter having a pore sizes of 0À025 microns which retains the aggregates, then subjecting the filtrate to successive fractionating operations using three successive diaphragms having nominal porosities defined by the retention of molecules of (1) 100,000 g., (2) 25,000 g. and then (3) 1000 g. Uses.-Optical microwaveguides capable of transmitting a light wave, e.g. a LASER beam of about 1 micron in width, which are integrated into a substrate, e.g. a silicate substrate. The waveguide may be prepared by depositing the resin on the substrate by centrifuging a solution of the resin in an atmosphere saturated with the same solvent as used for the resin, e.g. benzene, then crosslinking the resulting resin layer with electronic radiation using electronic masking. |
| priorityDate | 1975-03-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 28.