http://rdf.ncbi.nlm.nih.gov/pubchem/patent/GB-1484873-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e9ec95f75bc5dcc8f2c6f36fd3ee1ca6 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03G15-05 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G59-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08G59-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate | 1974-10-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 1977-09-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | GB-1484873-A |
| titleOfInvention | Delineating a pattern in a negative resist composition |
| abstract | 1484873 Electron sensitive processes WESTERN ELECTRIC CO Inc 23 Oct 1974 [23 Oct 1973] 45812/74 Headings G2C and G2X A process for producing negative resists comprises (1) imagewise exposing to electron beams or x-rays a material comprising a support and a layer of an uncured polymer which contains an ethylenically unsaturated main chain with branches of aliphatic groups at least some of which contain cross-linkable epoxy groups connected to the main chain through at least one atom and there being at least one epoxy group per 5 monomer units; the weight average molecular weight (M n ) being 10<SP>3</SP> to 10<SP>6</SP> and the ratio M w :M n is less than 5, M n being the number average molecular weight; the lower temperature limit of the glass transition temperature range (Tg) being below the lowest temperature of the material before exposure, and (2) removing the unexposed and uncross-linked areas with a developer. Specified polymers are poly'glycidyl acrylate, glycidyl methacrylate/ethyl acrylate copolymers and polymers which contain vinyl ferrocene which acts as an x-ray absorber, the polymers preferably having a Tg below 22C. Polyglycidylmethacrylate (Tg = 46C) is stated to be unevitable. The developed resist may be post baked for 5-30 minutes at 60-130C to increase cross-linking. The resist may be stripped off the support by hot (50C) chromic acid solution or by an oxygen plasma at 300w., 25 milltorr. pressure. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5496438-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/GB-2285141-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/GB-2285141-B http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-4485166-A |
| priorityDate | 1973-10-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 27.