http://rdf.ncbi.nlm.nih.gov/pubchem/patent/GB-1480705-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_24aca9ded2638ea793d05360dde7a4a0 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-32 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-30 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03C5-30 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-32 |
| filingDate | 1975-03-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 1977-07-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | GB-1480705-A |
| titleOfInvention | Process for developing a photosensitive resin plate after exposure |
| abstract | 1480705 Developing photo-sensitive resin plates SUMITOMO CHEMICAL CO Ltd 3 March 1975 [4 March 1974] 8789/75 Heading G2C Exposed photo-sensitive resin plates are developed by treatment with an aqueous solution containing 0À01 to 5 wt. per cent of a water-soluble alkali-metal aluminate, e.g. sodium or potassium aluminate, to remove resin at the non-exposed areas. The photo-sensitive resin composition may comprise an unsaturated polyester e.g. fumaric acid/ isopthalic acid/diethylene gylcol, a copolymer of acrylic or methacrylic acid e.g. copolymethyl methacrylate/methacrylic acid, or a cellulose or polyvinyl alcohol derivative having an oxyacial residue in a side chain together with a vinyl monomer e.g. triethylene glycol dimethacrylate, a photopolymerization initiator e.g. benzoin methyl ether and a thermal inhibitor e.g. hydroquinone. |
| priorityDate | 1974-03-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 31.