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filingDate 1973-10-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 1976-10-06-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber GB-1451623-A
titleOfInvention Method of prov8ding a patterned layer of silicon-containing oxide on a substrate
abstract 1451623 Coated products MULLARD Ltd 1 Oct 1973 45771/73 Heading B2E [Also in Division Cl] A method of forming a patterned oxide layer consisting predominantly or entirely of silica on a substrate, comprises applying to the substrate a coating comprising a polymenisable siloxane material containing silicon-bound hydroxy groups and/or hydrolysable groups and an ultra-violet sensitive sensitiser which can be converted by ultra-violet radiation to an activated form which catalyses the formation of oxygen bridges between silicon atoms bonded to the hydroxy groups and/or hydrolysable groups in the polymerisable siloxane material, exposing the coating to ultra-violet radiation in accordance with a desired pattern, and then subjecting the exposed coating to a development treatment whereby the exposed areas of the coating are removed and finally converting the desired pattern of a silicon-containing material on the substrate into an oxide layer consisting predominantly or entirely of silica having the desired pattern. The sensitiser may have acidic or basic reactivity. Particularly preferred are triazines, particularly those in which the amino group belongs to a guanidine group, preferably a phenyl diazo guanidine, and in particular one having the structure of formula: in which (R) n denotes 0, 1, 2, or 3 substituents and R 9 is hydrogen or methyl. Polymerisable monomeric or partly polymerised siloxanes may be used. Cyclic siloxanes are preferred, for example, those having ring structures of Si-O groups.
priorityDate 1973-10-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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