| abstract |
The composition is prepared by reacting carbon disulphide with a resin which in its molecular structure contains imino and/or amino groups. Said resin is a urea resin, a thiourea resin, a melamine resin, an aniline resin, a urethane resin, a polyamide resin, a hydrazide condensation product or a reaction product of an amino compound with polyvinyl chloride, polyvinylidene chloride, polyvinyl bromide, polyvinylidene bromide, poly(1-chloro-1-bromoethylene), poly(1-chloro-1-fluoroethylene), chlorinated polyethylene, chlorinated polypropylene or a copolymer of vinyl chloride, vinylidene chloride, vinyl bromide, vinylidene bromide, 1-chloro-1-bromoethylene or 1-chloro-1-fluoroethylene with acrylonitrile, vinyl acetate, acrylic acid, methacrylic acid, methyl methacrylate, methyl acrylate, ethyl acrylate or butyl acrylate. The composition can be used to remove heavy-metal ions from solutions or gases. To this end, the composition is brought into contact with the solution containing heavy-metal ions or the gas containing heavy-metal ions. Examples of such heavy-metal ions are ions of mercury, lead, chromium, cadmium, arsenic, copper and iron. |