http://rdf.ncbi.nlm.nih.gov/pubchem/patent/GB-1422437-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_396211729efa491d43d8cc7d83783722 |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N21-552 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G01N21-49 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N21-55 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G01N21-17 |
| filingDate | 1973-11-12-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 1976-01-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | GB-1422437-A |
| titleOfInvention | Method and apparatus for measruing vapour pressure |
| abstract | 1422437 Porous glass sensors PHYSCHEMICAL RESEARCH CORP 12 Nov 1973 [6 June 1973] 52419/73 Heading C1M [Also in Divisions G1 and G2] A glass member, preferably rod-shaped, is formed with a surface comprising a plurality of microcapillary pores, generally of diameters between 100 and 400 Š and depths at least equal to their diameters, so as to provide a sensor member for use with photo-electric apparatus (see Division G1) in the measurement of relative vapour pressure. Method of manufacture.-The raw material is borosilicate glass comprising 5% Na 2 O; 14% B 2 O 3 ; 80% SiO 2 ; plus other oxides (Al 2 O 3 ; K 2 O). (1) Samples are heated in furnace at 590- 630‹ C. for 45-170 hrs. for phase separation between (B 2 O 3 -Na 2 O) and SiO 2 . (2) Samples are leached in 6À0 to 6À8 N HCl for 5-20 hrs. at 80-110‹ C. to dissolve out (B 2 O 3 -Na 2 O) phase, leaving deep, narrow bottle-neck shaped pores, 30-50 Š diameter of silica. (3) Samples are etched in 0À1 to 0À5 N HF for 10-300 mins. to increase pore diameter to 100- 400 Š and convert to cylindrical shape. (After steps (2) and (3) thorough washing.) (4) Sample ends ground and polished. (5) Mounting to photo-electric apparatus. Additional strength &c. is provided by pre- and post-furnace annealing (in step (1)) and (before step (5)) by coating silica capillary walls with hydrophobic silane film using methyl silane in gaseous form at 25‹ C. for 5 mins. Further modifications to the process are described. |
| priorityDate | 1973-06-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 18.