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classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03C1-705
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03C1-705
filingDate 1972-08-21-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationDate 1973-12-19-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber GB-1341159-A
titleOfInvention Formation of relief images
abstract 1341159 Etching INSTITUT POLYPROVODNIKOV AKADEMII NAUK 21 Aug 1972 38820/72 Heading B6J An assembly comprising a backing layer (e.g. fused quartz or glass), a base layer of metal or alloy (e.g. nickel), a layer of a second metal (e.g. silver), and a top layer of an inorganic compound (e.g. arsenic trisulphide) which reacts photochemically with the second metal to form a reaction product when exposed to electromagnetic radiation, is exposed to such radiation imagewise (e.g. through a stencil), and the exposed assembly is then etched to form a relief image. In one form, the etching agent removes the reaction product and partly or wholly removes the underlying portions of the base metal layer, the etching agent being ferric chloride and copper, or (if the base metal is nickel) orthophosphoric acid. and potassium manganese oxide. The unreacted arsenic trisulphide and silver may also be removed with nitric acid. In another form, the unreacted arsenic trisulphide is removed with potassium hydroxide, sodium hydroxide or sodium carbonate, and the underlying second metal is removed and the underlying base metal partially or wholly removed with ferric chloride and copper or orthophosphoric acid and potassium manganese oxide, and the reaction product may then be removed with nitric acid.
priorityDate 1972-08-21-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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