http://rdf.ncbi.nlm.nih.gov/pubchem/patent/GB-1317796-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_e9ec95f75bc5dcc8f2c6f36fd3ee1ca6 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0226 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-022 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03C1-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03C1-72 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-08 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-00 |
| filingDate | 1970-06-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 1973-05-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | GB-1317796-A |
| titleOfInvention | Positive quinone diazide photoresists |
| abstract | 1317796 Additives to positive quinon diazide photo-resists WESTERN ELECTRIC CO Inc 10 June 1970 [13 June 1969 23 March 1970] 28089/70 Heading G2C An image is generated on a substrate by exposure to an electron beam or light and developing, the substrate being coated with a positive quinone diazide photo-resist containing at least 0À5 weight per cent of a compound which increases the sensitivity of the photo-resist to exposure and which is (A) an aromatic compound containing at least two heterocyclic nitrogen atoms having bonds to nitrogen, carbon and/or hydrogen atoms, at least one of the heterocyclic nitrogens being bonded to a hydrogen atom, the heterocyclic ring containing no other heterocyclic atoms, (B) 2- azacyclononanone, (C) indole, (D) quinazoline or (E) 6, 7-dihydro-5H-pyrolo [3, 2-d]- tetrazole. (A) may be benzotriazole, 5-methylbenzotriazole, 5-chlorobenzotriazole, 5, 6-dimethylbenzotriazole, 1, 2-naphthotriazole, indazole, 5-nitroindazole, 5-amino-indazole, 6-aminoindazole, 4-azabenzimidazole, imidazole, or 6-azauracil. Compounds (A) also increase the amount of radiation required to over expose the photo-resist. The substrate may be a chromium coated glass plate. The coated plate may be exposed to electrons accelerated at 15KV in a vacuum chamber, and be developed by washing with a sodium hydroxide solution and de-ionized water and baking at 150‹C. for 10 minutes. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5310619-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-5362607-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/EP-0265375-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/FR-2500645-A1 |
| priorityDate | 1969-06-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 59.