http://rdf.ncbi.nlm.nih.gov/pubchem/patent/GB-1263582-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_586efc626eb4a295d0847e4b2e1022de |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J2237-332 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-321 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C14-022 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01J37-32082 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01J37-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-02 |
| filingDate | 1969-09-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9c8e99c0a5eb8c58b2e25f337308f52e http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0a9d26572715d8e1a039304f6b270f3c http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_31e188e5cea04b847c70524b1e970f84 |
| publicationDate | 1972-02-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | GB-1263582-A |
| titleOfInvention | Improvements in or relating to thin film deposition |
| abstract | 1,263,582. Vacuum vapour deposition. BARR & STROUD Ltd. Aug.21, 1970 [Sept. 19, 1969], No.46185/69. Heading C7F. A method of depositing a thin film on a surface by evaporation within a vacuum chamber which includes a discharge source of electromagnetic energy for effecting cleaning of a said surface includes the steps of reducing the pressure within the chamber to approximately 10<SP>-5</SP> Torr, energizing said energy source, leaking gas into the chamber to raise the pressure therein to approximately 5 x 10<SP>-5</SP> Torr to enable a discharge from said source to be sustained; during said discharge heating the evaporant and confining heated evaporant in an enclosure, and releasing said heated evaporant after a predetermined time whereby the evaporant is deposited in thin film form on the surface. One or more layers may be deposited; substrates mentioned are glass, Si, Ge, arsenic triselenide and arsenic trisulphide; the coating may be MgF 2 or Al and the atmosphere air. The discharge source of electromagnetic energy may comprise a R.F. generator of 200 watts output at 10-20 MHz in conjunction with an amplifier and quarter-wavelength aerial; the latter may be outside a non-conducting, e.g. glass, chamber or inside a metal coating chamber. D.C. coils may be mounted outside the chamber to give a magnetic bottle effect to prevent discharge of R. F. energy via the chamber walls. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-4061800-A http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-9742648-A1 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-6254746-B1 |
| priorityDate | 1969-09-19-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 24.