http://rdf.ncbi.nlm.nih.gov/pubchem/patent/GB-1009435-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_9fc0a00eab3a757e8324b1e887d7ba97 |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L2924-0002 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23D5-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L23-291 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23D5-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L23-29 |
| filingDate | 1962-04-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationDate | 1965-11-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | GB-1009435-A |
| titleOfInvention | Semiconductive circuit elements and method of protecting the same |
| abstract | 1,009,435. Semi-conductor devices. MOTOROLA Inc. April 27, 1962 [May 11, 1961], No. 16204/62. Heading H1K. The formation of protective grown glassy oxide coatings on the bodies of silicon and germanium devices is accelerated by incorporating in the glass as it forms one or more inorganic materials which modify or weaken the interatomic bonds in the network structure of the glass. This enables either one or both of the following processes to occur more rapidly: (a) diffusion of semi-conductor atoms through the oxide layer with subsequent oxidation, (b) diffusion of oxygen through the oxide layer to the semi-conductot surface which it oxidizes. Suitable accelerating agents are Pb; Li, Na, K; Be, Mg, Ca, Sr, and Ba. Other materials such as B, Al, Ga, Ih, Tl; P, As, Sb, and Bi may be used in conjunction with Pb to form ternary or quarternary glasses. Zn, Cd, Sn and, with silicon devices, Ge may be used in conjunction with halogens. The production of a typical silicon diode (shown in Fig. 4) uses a monocrystalline silicon wafer in which a junction 20 is formed by diffusion. Ohmic contacts of Ni, An, Rh, Pt, Ir, or Pd are applied to both main faces by electroplating, electroless plating, evaporating, or sputtering. The wafer is converted to a plurality of dice either by suitable scribing followed by breaking along the scribed lines, or by masking the dice-forming areas with photo-resist or wax and etching between them with e.g. HF/HN0 3 . It may be necessary to etch through the contents with e.g. aqua regia before etching the silicon. The devices with their electrodes 17, 18 are cleaned and placed in the alumina reaction chamber of a furnace, Fig. 7 (not shown), and the oxide film 19 on each grown by heating in an atmosphere containing oxygen and vapour from a source of lead oxide or of mixed lead and antimony oxides. In the mass production of germanium mesa-type transistors a germanium slab, Fig. 5 (not shown), having a plurality of mesas containing a diffused junction and provided with base and emitter electrodes 34, 35, is heated in an oxygencontaining atmosphere in the presence of lead oxide vapour or of the mixed vapours of lead oxide and bromide. A modified germanium oxide glass is thus formed over the areas of the wafer not covered by electrodes. The wafer is then cut to provide a plurality of transistors, Fig. 6, in each of which the surface portion of the junction 33 is protected by a glass layer 36. It is stated in the Specification that " surface doping " of the semi-conductor body can be achieved by including in the glass film components which modify the surface states of the material. |
| priorityDate | 1961-05-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
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