http://rdf.ncbi.nlm.nih.gov/pubchem/patent/FR-3085389-A1

Outgoing Links

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filingDate 2018-09-03-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_291deb69df61f53ac7761387ace99f10
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publicationDate 2020-03-06-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber FR-3085389-A1
titleOfInvention METHOD FOR ETCHING A BLOCK COPOLYMER COMPRISING A SELECTIVE DEPOSITION STEP
abstract The invention relates to a method for etching a layer (20) of assembled block copolymer comprising first and second polymer phases (20A, 20B). This etching process comprises: - a step (S21) of selective deposition carried out by means of a first plasma so as to deposit a protective material (23) on the first polymer phase (20A) while leaving the second polymer phase intact (20B); and - a step of etching the second polymer phase (20B) selectively with respect to the protective material (23) by means of a second plasma.
priorityDate 2018-09-03-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

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http://rdf.ncbi.nlm.nih.gov/pubchem/patent/WO-2017042312-A1
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Total number of triples: 26.